ILW.COM - the immigration portal Immigration Daily

Home Page


Immigration Daily

Archives

Processing times

Immigration forms

Discussion board

Resources

Blogs

Twitter feed

Immigrant Nation

Attorney2Attorney

CLE Workshops

Immigration books

Advertise on ILW

VIP Network

EB-5

移民日报

About ILW.COM

Connect to us

Make us Homepage

Questions/Comments


SUBSCRIBE

Immigration Daily


Chinese Immig. Daily




The leading
immigration law
publisher - over
50000 pages of
free information!
Copyright
1995-
ILW.COM,
American
Immigration LLC.

View RSS Feed

Greg Siskind on Immigration Law and Policy

IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR

Rate this Entry

John_Macdougall_lr Today I honor Canadian-born John MacDougall as the fourth living immigrant inductee in to this year's National Inventor Hall of Fame. MacDougall invented a process of "ion bombardment" that is a critical technology used in circuitry in today's computers. According to the Hall of Fame:

John Macdougall is one of the inventors of the
first commercially viable method of ion implantation, a process that
changes the conductivity of areas of a silicon wafer -- or "dopes" them
-- by bombarding them with ionized atoms. When the wafer is heated,
each implanted atom replaces a silicon atom. This permits very precise
construction of different areas of conductivity. When linked together,
these form the components of an integrated circuit.


Macdougall
and his colleagues built an ion implantation machine from scratch at
Sprague Electric Co., which was one of the major investors in MOSTEK, a
start-up integrated circuit manufacturer. MOSTEK's leadership
recognized the importance of ion implantation and had a
commercial-scale, automated machine - probably the world's first--built
by Accelerators Inc. in Texas, and installed first in their
Massachusetts facility and later in their Texas plant. MOSTEK had
invested everything in the ion bombardment process. If the products
that resulted had failed, the company would have as well. Today, ion
implantation is the dominant doping method in the production of
integrated circuits.


Born in
Sussex, New Brunswick, Canada, Macdougall received a B.Sc. from the
University of New Brunswick in 1962 and a Ph.D. from McMaster
University in 1966. He has been employed by Sprague Electric and its
successor company Allegro Microsystems throughout his career.


Attached Thumbnails Attached Thumbnails Click image for larger version. 

Name:	7aab031eee.jpg 
Views:	35 
Size:	51.1 KB 
ID:	295  

Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to Facebook Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to Twitter Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to Google Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to StumbleUpon Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to Reddit Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to Digg Submit "IMMIGRANT OF THE DAY: JOHN MACDOUGALL - INVENTOR" to del.icio.us

Tags: None Add / Edit Tags

Comments

Put Free Immigration Law Headlines On Your Website

Immigration Daily: the news source for legal professionals. Free! Join 35000+ readers Enter your email address here: